Multilevel imaging of photopolymer relief layer for the preparat

Details Multilevel imaging of photopolymer relief layer for the preparat Multilevel imaging of photopolymer relief layer for the preparat

1985-03-26

1987-05-26

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430322, 430327, 430394, 164 6, 264220, G03F 702

Patent

active

046686070

ABSTRACT:
Process for photofabricating master relief patterns from photohardenable layers, e.g., 0.01 to 0.5 inch (0.25 to 12.7 mm in thickness) which comprises: (1) exposing the layer through the back surface to first imagewise modulated actinic radiation for time to render layer insoluble to first preselected depth which when measured from back surface to less than layer thickness, (2) exposing overall to actinic radiation through back to render layer insoluble to second preselected depth which when measured from back surface is less than first preselected depth. (3) exposing imagewise through front surface to actinic radiation for a time sufficient to render exposed areas of layer insoluble to depth extending from front surface to at least second preselected depth, and (4) solvent removing soluble areas of layer.
The master relief pattern is useful in making casting molds.

REFERENCES:
patent: 2244187 (1941-06-01), Cochran
patent: 3249436 (1966-05-01), Halpern
patent: 3277541 (1966-10-01), Wilton et al.
patent: 4329385 (1982-05-01), Banks et al.
Polish Technical Review, 144-143, Nos. 1-3, pp. 38-40, 1982, Technology of Manufacturing Photo Relief Form.

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