Positive photoresist with antireflection coating having thermal

Details Positive photoresist with antireflection coating having thermal Positive photoresist with antireflection coating having thermal

1985-11-20

1987-05-26

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430165, 430166, 430191, 430270, 430312, 430326, 430510, 430512, G03C 1495, G03C 176

Patent

active

046686061

ABSTRACT:
There are disclosed antireflecting compounds and layers used in admixture with or adjacent to a positive-working, non-silver halide photosensitive layer. The resulting antireflecting layers have unexpected thermal resistances, needed for the thermal planarization usually given to such photoresists.

REFERENCES:
patent: 2211408 (1940-08-01), Dieterle et al.
patent: 3369904 (1968-02-01), Faber
patent: 3627527 (1971-12-01), Gilman et al.
patent: 4535053 (1985-08-01), West et al.
patent: 4557797 (1985-12-01), Fuller et al.
patent: 4575480 (1986-03-01), Kotani et al.
patent: 4609614 (1986-09-01), Pampalone et al.
Brewer, T. et al., J. of Applied Photographic Engineering, vol. 7, No. 6, 12/1981, pp. 184-186.
Marvell, E. N. et al., "Formation of Phenylpyridinium Chloride from 5-Anilino-N-phenyl-2,4-pentadienylideniminium Chloride, Kinetics in Basic Media" Journal of the American Chemical Society, vol. 92, No. 19, pp. 5641-5645, Sep. 23, 1970.

Affiliated with

Also associated with

Rating

Positive photoresist with antireflection coating having thermal does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive photoresist with antireflection coating having thermal , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photoresist with antireflection coating having thermal will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-703493