Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Patent
1998-06-17
1999-09-28
Breneman, R. Bruce
Etching a substrate: processes
Gas phase etching of substrate
With measuring, testing, or inspecting
156345, 356316, 438710, G01N 2100
Patent
active
059582588
ABSTRACT:
A susceptor on which a wafer is placed, and an upper electrode are arranged in the processing chamber of an etching apparatus to oppose each other. An optical transmission window is disposed in the side wall of the processing chamber. The upper electrode and the susceptor are supplied with RF powers from a second RF power supply and a first RF power supply, respectively, to excite a plasma in the processing chamber. Emission of the plasma is detected by an optical detector through the optical transmission window, and data is sampled. In a CPU, the sampling data is subjected to fitting based on the Weibull distribution function, thus obtaining an approximate equation, and furthermore the differential equation of the approximate equation is obtained. The virtual end point of etching is expected from the approximate equation and differential equation.
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Ishihara Hiroyuki
Kawamura Kohei
Breneman R. Bruce
Tokyo Electron Yamanashi Limited
Vanoy Timothy C
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