Spin dryer apparatus

Details Spin dryer apparatus Spin dryer apparatus

1997-03-19

1998-11-03

Bennett, Henry A.

Drying and gas or vapor contact with solids

Apparatus

With apparatus using centrifugal force

F26B 1724

Patent

active

058291563

ABSTRACT:
A spin dryer apparatus substrate such as a wafer can dry without degrading the cleanliness on both front and back sides of the wafer and without unnecessary cost increases. The spin dryer apparatus includes a holder section for holding a substrate in a substantially horizontal plane and defining a back space located beneath a back surface of the substrate, a driving section for rotating the holder section in the substantially horizontal plane, and a gas supply mechanism for supplying a clean gas into the back space. It is possible to avoid contamination of the back side of the substrate by preventing an ascending gas flow from approaching the substrate. A nozzle device is available for supplying a cleaning fluid on the substrate

REFERENCES:
patent: 5083381 (1992-01-01), Aigo
patent: 5375291 (1994-12-01), Tateyama et al.
patent: 5435075 (1995-07-01), Shiraishi et al.
patent: 5651160 (1997-07-01), Yonemizu et al.
patent: 5667535 (1997-09-01), Kasahara

Affiliated with

Also associated with

Rating

Spin dryer apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Spin dryer apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Spin dryer apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-678483