Fractionated novolak resin from cresol-formaldehyde reaction mix

Details Fractionated novolak resin from cresol-formaldehyde reaction mix Fractionated novolak resin from cresol-formaldehyde reaction mix

1999-02-19

2000-08-01

Mullis, Jeffrey C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

G03C 193

Patent

active

060964774

ABSTRACT:
The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.

REFERENCES:
patent: 5073622 (1991-12-01), Wojtech et al.
Sumitomo Chemical, WPIDS Abstract 87-252532, abstracting JP62172341, Jul. 1987.

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