High-efficiency, multilevel, diffractive optical elements

Details High-efficiency, multilevel, diffractive optical elements High-efficiency, multilevel, diffractive optical elements

1987-09-21

1990-01-23

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430320, 430323, 430394, 156643, 156654, 1566591, 3501622, 35016221, 35016224, 350409, 350417, G03C 500, B29D 1100

Patent

active

048957909

ABSTRACT:
The method utilizes high resolution lithography, mask aligning, and reactive ion etching. In particular, at least two binary amplitude masks are generated. A photoresist layer on an optical element substrate is exposed through the first mask and then etched. The process is then repeated for the second and subsequent masks to create a multistep configuration. The resulting optical element is highly efficient.

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