Method of making a scratch-resistant mask for photolithographic

Details Method of making a scratch-resistant mask for photolithographic Method of making a scratch-resistant mask for photolithographic

1977-02-28

1978-03-28

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156 89, 156654, 156663, 427272, 427282, 427292, 427309, 427375, B44C 122, C03C 1500, C03C 2506

Patent

active

040813142

ABSTRACT:
Disclosed is a photomask and a method for the manufacture thereof. A metal stencil is disposed on a glass substrate such that only preselected areas of the glass which are to be made opaque are exposed. A grit-etch step follows in which depressions are formed in the glass substrate in the preselected areas. Fusible masking material is sprayed in the depressions through the metal stencil. The masking material is preferably in particulate form in a volatile carrier liquid. The carrier liquid is preferably first driven off and, then, the combination is exposed to a relatively high temperature that fuses the masking material to the substrate.

REFERENCES:
patent: 2347011 (1944-04-01), Walker
patent: 2559389 (1951-07-01), Beeber et al.
patent: 3887421 (1975-06-01), Hudson et al.
patent: 3895147 (1975-07-01), Ahn et al.
patent: 3956052 (1976-05-01), Koste et al.

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