Vacuum treatment apparatus

Details Vacuum treatment apparatus Vacuum treatment apparatus

1993-02-09

1995-05-16

Dang, Thi

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

156345, 118733, 20429802, 20429835, 20429831, F16J 1500

Patent

active

054157293

ABSTRACT:
A vacuum treatment apparatus which is used for the surface treatment of substrates or workpieces in a chamber, includes at least one pneumatically or hydraulically operated seal. The seal can be activated to close against a member for sealing off the chamber, particularly, after a substrate or workpiece has been transported into or removed from the chamber.

REFERENCES:
patent: 4611110 (1986-09-01), Astner et al.
patent: 4735421 (1988-04-01), Neef et al.
Search Report in Swiss Application 419/92 filed Feb. 12, 1992.

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