Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-11-23
1998-04-14
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429825, 20429828, 414217, 414222, C23C 1434
Patent
active
057387672
ABSTRACT:
A vacuum processing system for handling and processing rectangular glass panels for flat panel displays has a cluster configuration. The system includes a central buffer chamber, with multiple processing chambers, a load lock and an unload lock positioned around the buffer chamber and coupled to the buffer chamber through gate valves. The buffer chamber contains a turntable that is rotatable about a vertical axis. The system further includes substrate carriers, each for supporting a substrate in a vertical orientation as it is transported through the system and is processed. The turntable has dual substrate carrier positions for rotating substrate carriers into alignment with a selected processing chamber, the load lock or the unload lock. Multiple substrates can be handled and processed concurrently to achieve a high throughput rate. The system is typically used for sputter deposition of ITO films and metal films on the glass substrate.
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Coad George L.
Hughes John Lester
Lawson Eric C.
Cole Stanley Z.
Intevac, Inc.
McClellan William
Nguyen Nam
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