Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1994-09-01
1998-04-14
Dang, Thi
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
118724, 118728, 279128, 361234, 165 801, B25B 1100
Patent
active
057387516
ABSTRACT:
A substrate support member includes a pedestal and conductive member. The conductive member is cooled by the passage of a coolant therethrough, and a heat transfer enhancing fluid is flowed into the interface between the pedestal and the conductive member to increase the heat transfer from the pedestal to the conductive member.
REFERENCES:
patent: 4512391 (1985-04-01), Harra
patent: 4949783 (1990-08-01), Lakios et al.
patent: 5155652 (1992-10-01), Logan et al.
patent: 5213349 (1993-05-01), Elliott
patent: 5215619 (1993-06-01), Cheng et al.
patent: 5221403 (1993-06-01), Nozawa et al.
patent: 5238499 (1993-08-01), van de Ven et al.
patent: 5290381 (1994-03-01), Nozawa et al.
patent: 5354382 (1994-10-01), Sung et al.
patent: 5376213 (1994-12-01), Ueda et al.
patent: 5382311 (1995-01-01), Ishikawa et al.
Applied Materials Inc.
Dang Thi
Janah Ashok K.
Mulcahy Robert W.
Sgarbossa Peter J.
LandOfFree
Substrate support having improved heat transfer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate support having improved heat transfer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate support having improved heat transfer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-631996