Positive resist composition comprising a bis (t-butoxycarbonylme

Details Positive resist composition comprising a bis (t-butoxycarbonylme Positive resist composition comprising a bis (t-butoxycarbonylme

1995-02-14

1996-04-30

Chu, John S. Y.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430905, 430917, 430918, 430942, 430966, G03F 7004, G03F 7039

Patent

active

055124178

ABSTRACT:
A positive resist composition comprising a poly(p-hydroxystyrene) as matrix resin which is synthesized by an anionic polymerization method and has a weight average molecular weight of from 8,000 to 20,000, bis(p-t-butoxycarbonylmethyl)thymolphthalein as dissolution inhibitor, bis(p-t-butylphenyl)iodonium triflate as acid generator; a compound which contains one amino group and one carboxyl group to function as acid deactivator and propylene glycol monomethyl ether acetate as organic solvent.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4968581 (1990-11-01), Wu et al.
patent: 5173389 (1992-12-01), Uenishi et al.
patent: 5332648 (1994-07-01), Kihara et al.
patent: 5348838 (1994-09-01), Ushirogouchi et al.
patent: 5403695 (1995-04-01), Hayase et al.

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