Developer solutions for PMMA electron resist

Details Developer solutions for PMMA electron resist Developer solutions for PMMA electron resist

1988-02-24

1989-10-31

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430331, 430162, 430170, G03C 534, G03C 524

Patent

active

048777161

ABSTRACT:
An improved developer for PMMA electron resist comprising an effective amount of MEK in combination with MIBK or CS alone or a mixture thereof.

REFERENCES:
patent: 4348471 (1982-09-01), Shelnut et al.
patent: 4350753 (1982-09-01), Shelnut et al.
patent: 4476217 (1984-10-01), Douglas et al.
patent: 4551387 (1985-11-01), Manabe et al.

Affiliated with

Also associated with

Rating

Developer solutions for PMMA electron resist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Developer solutions for PMMA electron resist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Developer solutions for PMMA electron resist will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-625445