Polymers for aqueous processed photoresists

Details Polymers for aqueous processed photoresists Polymers for aqueous processed photoresists

1978-06-19

1980-12-16

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 430910, G03C 168

Patent

active

042398495

ABSTRACT:
A new photopolymerizable composition which contains an addition polymerizable monomer, a photoinitiator, and an improved binding agent which is a polymer of three types of monomeric materials, namely, a styrene-type monomer, an acrylate monomer, and an alpha, beta-unsaturated carboxyl-containing monomer. These compositions are useful for flexible photopolymerizable films which, after exposure, may be developed in aqueous alkaline solutions. These films may be used as photo-resists, screen stencils and printing plates.

REFERENCES:
patent: 3765898 (1973-10-01), Bauer et al.
patent: 3833384 (1974-09-01), Noonan et al.
patent: 3850770 (1974-11-01), Juna et al.

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