Method for creating a design in relief in a hard smooth substrat

Details Method for creating a design in relief in a hard smooth substrat Method for creating a design in relief in a hard smooth substrat

1986-10-27

1988-02-23

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430322, 430325, 430326, 430329, 430331, G03C 500

Patent

active

047270136

ABSTRACT:
A method is provided for acid etching or sandblasting decorative designs in the smooth surface of hard substrates such as glass, ceramics, plastics, and marble, granite, or other stones. A dry film photoresist, preferrably a solder mask, is applied to the smooth surface without the addition of heat. The decorvative design is placed on the dry film by exposing the dry film to ultraviolet light through a negative of the design to place the design on the surface of the photoresist. The dry film is then developed to remove a portion of it. The smooth surface is then acid etched or sandblasted, with the portion of the dry film remaining on the smooth surface protecting that portion of the smooth surface from the acid etching or sandblasting process. An apparatus is also provided for applying the dry film photoresist to the substrate.

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"Dry Film Photoresists in Microelectronics," Denis G. Kelemen, published Aug., 1976, in Solid State Technology, vol. 19, No. 8, pp. 37-38.

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