Method of making P1 notched write head with minimum overmilled P

Details Method of making P1 notched write head with minimum overmilled P Method of making P1 notched write head with minimum overmilled P

1999-03-30

2000-08-22

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, 20419235, 2960315, 2960313, 216 22, 216 27, C23C 1434, C11B 5127, C11B 5187

Patent

active

061066796

ABSTRACT:
A magnetic head is provided which has first and second notches in a first pole piece layer adjacent first and second corners at the base of a gap layer wherein the gap layer does not undercut a base of a second pole tip. Field regions of the first pole piece layer which extend from the first and second notches slope upwardly from the notches for protecting components below the first pole piece layer. In one aspect of the invention a method of defining the gap layer sputter deposition and ion milling steps are employed to form a protective layer on first and second side walls of the second pole tip so that unwanted portions of the gap layer can be removed without undercutting the gap layer below the base of the second pole tip. In another aspect of the invention a method of making the first and second notches by sputter deposition and etching are employed to define a protective layer with first and second openings where the first and second notches are to be formed following by ion milling which mills through the openings through the notches until the protective layer is consumed.

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Anonymous, "Self-Aligned, Low-Aspect Ratio Ion Milling Mask", Research Disclosure, Jun. 1990, No. 31480.

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