Asymmetrical field effect transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257344, 257401, 257408, 257654, H01L 2902

Patent

active

06015991&

ABSTRACT:
Disclosed is an asymmetric field effect transistor which comprises a first region serving as source, a second region serving as drain, a thin gate oxide and a gate electrode. The gate electrode is asymmetric and one of its sidewalls is sloped. The second region extends underneath said sloped sidewall. The part of said second region which extends underneath said gate electrode is less doped than the remaining part of said second region. Furthermore, said second region has a sloped junction edge underneath said gate electrode.

REFERENCES:
patent: 4258465 (1981-03-01), Yasui et al.
patent: 4329186 (1982-05-01), Kotecha et al.
patent: 4419809 (1983-12-01), Riseman et al.
patent: 4599118 (1986-07-01), Han et al.
patent: 5177571 (1993-01-01), Satoh et al.
patent: 5234852 (1993-08-01), Liou
patent: 5300786 (1994-04-01), Brunner et al.
patent: 5368962 (1994-11-01), Kiryu et al.
patent: 5370975 (1994-12-01), Nakatani
patent: 5518945 (1996-05-01), Bracchitta et al.
patent: 5547789 (1996-08-01), Nakatani et al.
C-H. Hsu and D-S. Wen, "Method for Making Self-Aligned, Reverse-T Gate LDD MOSFET", IBM Technical Disclosure Bulletin, vol. 32, No. 3B, Aug. 1989, pp. 154-155.
Y. Taur and L. K. Wang, "Process for Fabricating Lightly Doped Drain MOS Devices with Punch-Through Stoppers", IBM Technical Disclosure Bulletin, vol. 27, No. 11, Apr. 1985, pp. 6622-6623.
M. Hargrove, E. Miersch, G. Pittman and D. Thomas, "Integrated SCHOTTKY Diode in CMOS", IBM Disclosure Technical Bulletin, vol. 28, No. 12, May 1986, pp. 5178-5179.
R. L. Mohler aNd S. S. Roth, "LDD Sidewall Spacers without Reactive Ion Etch", IBM Technical Disclosure Bulletin, vol. 27, No. 7B, Dec. 1984, pp. 4362-4364.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Asymmetrical field effect transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Asymmetrical field effect transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Asymmetrical field effect transistor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-564922

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.