Method for dose calculation of photolithography projection print

Details Method for dose calculation of photolithography projection print Method for dose calculation of photolithography projection print

1983-07-08

1984-10-02

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

355 77, 356 51, 430142, 430327, G03C 518, G03C 516, G03C 508, G03F 720

Patent

active

044748647

ABSTRACT:
A process for setting the exposure speed of photolithography instruments is described, using a method of dosimetry based on photoactive compound bleaching of photoresist. A curve of light absorbance to exposure speed and a calibration curve of light absorbance to dose are determined for a photoresist. The exposure speed for any desired degree of resist bleaching can be set using the first curve, and the exposure speed for a predetermined dosage can be set by determining the common light absorbance value on the exposure speed and dosage curves.

REFERENCES:
patent: 3046118 (1962-07-01), Schmidt
patent: 3077401 (1963-02-01), van der Grinten et al.
patent: 3397315 (1968-08-01), Johnston
patent: 3953135 (1976-04-01), Levy et al.
patent: 3977872 (1976-08-01), Hellmig
patent: 4128338 (1978-12-01), Wong
patent: 4212395 (1980-07-01), Canavello
patent: 4259430 (1981-03-01), Kaplan et al.

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