Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1983-05-23
1985-08-06
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430313, 430314, 430315, 430317, 430323, 430324, 430330, 430394, G03C 500, G03C 516
Patent
active
045336245
ABSTRACT:
A novel multilayer lift-off pattern of positive and negative photoresist materials is provided. A positive first layer is deposited on a substrate and flood exposed before a subsequent layer of negative photoresist material is added on top of the positive photoresist material. An optional third layer of positive photoresist material may be added on top of the negative photoresist to provide the top layer. A window or aperture is provided in the top layer employing conventional mask, exposure and development techniques. The top of the bottom layer is plasma etched through the window or aperture so that the previously flood exposed bottom layer can be developed without affecting the layers deposited thereon. A deep undercut lift-off pattern is provided which is useful in the manufacture of Josephson junction devices employing low temperature metals as well as for the manufacture of semiconductor devices.
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Lyman et al., J. Vac. Sci. Technol., 19(4), Nov./Dec. 1981, pp. 1325-1328.
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Hunt et al., J. Vac. Sci. Technol., 19(4), Nov./Dec. 1981, pp. 1308-1312.
Kaplan et al., IBM Technical Bulletin, vol. 15, 7, Dec. 1972, p. 2339.
Dees Jos,e G.
Kittle John E.
Scott Thomas J.
Sowell John B.
Sperry Corporation
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