Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1983-10-13
1985-01-29
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204192R, 204192EC, 204298, 156345, 156643, C23C 1500
Patent
active
044964480
ABSTRACT:
A method and apparatus for fabricating a device is disclosed, which method involves a new reactive ion etching technique. Both a high etch rate and, for example, a high etch selectivity are simultaneously achieved with the inventive reactive ion etching technique by discharging an electrode of the reactive ion etching apparatus in response to a preselected criterion, e.g., a magnitude of a DC bias at said electrode which equals, or exceeds, a preselected value.
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Geipel IBM Technical Disclosure Bulletin 20 (1977), pp. 541-542.
Tai King L.
Vratny Frederick
AT&T Bell Laboratories
Demers Arthur P.
Schneider Bruce S.
Tiegerman Bernard
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