Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-05-26
1990-09-04
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, C23C 1414
Patent
active
049542320
ABSTRACT:
In a magneto-optical recording element comprising a substrate, a magnetic layer and a dielectric layer, the dielectric layer is formed by deposition of a composition comprising Si.sub.3 N.sub.4 and a refractive index-improving agent such as Al.sub.2 O.sub.3 or Y.sub.2 O.sub.3. This dielectric layer has a high refractive index and the enhancement effect is improved. Moreover, this dielectric layer is excellent in the adhesion and resistance characteristics.
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Arimune Hisao
Maeda Takashi
Yamada Takashi
Kyocera Corporation
Marquis Steven P.
Niebling John F.
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