Method for forming a pattern of a film on a substrate with a las

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156638, 156656, 156667, 156902, 21912169, 21912185, 427 531, B44C 122, C03C 1500, C03C 2506, C23F 102

Patent

active

047863587

ABSTRACT:
An improved method for forming a pattern on a substrate coated with a film is shown. The substrate is irradiated with a laser beam which is shaped through a mask, and a portion of the film is removed by the energy of the laser beam to produce the desired pattern. The laser beam is emitted from an exmer laser.

REFERENCES:
patent: 3866398 (1975-02-01), Vernon et al.
patent: 3867217 (1975-02-01), Maggs et al.
patent: 4181563 (1980-01-01), Miyaka et al.
patent: 4358659 (1982-11-01), Spohnheimer
patent: 4508749 (1985-04-01), Brannon et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for forming a pattern of a film on a substrate with a las does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming a pattern of a film on a substrate with a las, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming a pattern of a film on a substrate with a las will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-433253

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.