Polyhydric compound and chemically amplified resist...

Details Polyhydric compound and chemically amplified resist... Polyhydric compound and chemically amplified resist...

2009-02-23

2011-12-06

Walke, Amanda C. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S910000, C430S913000, C430S914000, C560S114000, C560S116000

Reexamination Certificate

active

08071270

ABSTRACT:
The present invention provides a polyhydric compound represented by the formula (I):wherein R51to R67each independently represent a hydrogen atom etc., at least one selected from the group consisting of R1to R5is a group represented by the formula (II):wherein Q1and Q2each independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., and A+represents an organic counter ion, andthe others are hydrogen atoms or groups represented by the formula (III):wherein X1to X4each independently represent a hydrogen atom etc., n represents an integer of 0 to 3, W represents any one of the following groups:Z1represents a C1-C6 alkyl group etc., and ring Y represents a C3-C20 alicyclic hydrocarbon group, anda chemically amplified resist composition containing the same.

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patent: 2006-58739 (2006-03-01), None
Takemoto et. al., Molecular resists for EUV and EB Lithography, Proc. of SPIE, vol. 6923, 2008, pp. 69231N-1 to 69231N-8.

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