Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S365000, C257S153000

Reexamination Certificate

active

08058694

ABSTRACT:
In a semiconductor device, such as a MOSFET or the like, which is a high-frequency LSI achieving a low noise figure and a high maximum oscillation frequency and which has unit cells with a ring-shaped gate electrode arranged in an array, gate drawing wires connecting together the gate electrode and gate contact pad portions are arranged on a region excluding a drain region and a source region, that is, on an isolation region. Bending portions of the ring-shaped gate electrode are all formed on the isolation region. This therefore permits an improvement in high frequency characteristics such as noise, the maximum oscillation frequency, and the like while eliminating unnecessary gate capacity addition, and also permits small characteristic variation even if a machining shape of the bending portions of the gate electrode is unstable.

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patent: 6601224 (2003-07-01), Kiss et al.
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patent: 10-214971 (1998-08-01), None
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Shimomura, H., et al., “A Mesh Arrayed MOSFET (MA-MOS) for High-Frequency Analog Applications”, Symposium on VLSI Technology Digest of Technical Papers, Jun. 1997, pp. 73-74.
Hayashi, G., et al., “A 9mW 900MHz CMOS LNA with Mesh Arrayed MOSFETs”, Symposium on VLSI Circuits Digest of Technical Papers, Jun. 1998, pp. 84-85.

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