Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2010-09-20
2011-11-22
Mitchell, James (Department: 2813)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S622000
Reexamination Certificate
active
08062969
ABSTRACT:
The invention includes methods of electroless plating of nickel selectively on exposed conductive surfaces relative to exposed insulative surfaces. The electroless plating can utilize a bath which contains triethanolamine, maleic anhydride and at least one nickel salt.
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Baudrand, “Electroless Nickel Plating Surface Engineering”, ASM Handbook vol. 5, pp. 290-310.
Kondo et al., “Acceleration of Electroless Copper Deposition in the Presence of Excess Triethanolamine”, The Electrochemical Society, Inc., 1991, pp. 3629-3633.
Micro)n Technology, Inc.
Mitchell James
Wells St. John P.S.
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