Data processing: measuring – calibrating – or testing – Measurement system – Performance or efficiency evaluation
Reexamination Certificate
2008-12-22
2011-12-27
Charioui, Mohamed (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system
Performance or efficiency evaluation
Reexamination Certificate
active
08086422
ABSTRACT:
The distribution states of defects are analyzed on the basis of the coordinates of defects detected by an inspection apparatus to classify them into a distribution feature category, or any one of repetitive defect, congestion defect, linear distribution defect, ring/lump distribution defect and random defect. In the manufacturing process for semiconductor substrates, defect distribution states are analyzed on the basis of defect data detected by an inspection apparatus, thereby specifying the cause of defect in apparatus or process.
REFERENCES:
patent: 5240866 (1993-08-01), Friedman et al.
patent: 5479252 (1995-12-01), Worster
patent: 5831865 (1998-11-01), Berezin et al.
patent: 5943437 (1999-08-01), Sumie
patent: 5982920 (1999-11-01), Tobin et al.
patent: 6097887 (2000-08-01), Hardikar et al.
patent: 6317859 (2001-11-01), Papadopoulou
patent: 6466895 (2002-10-01), Harvey et al.
patent: 6507933 (2003-01-01), Kirsch et al.
patent: 6876445 (2005-04-01), Shibuya et al.
patent: 2002/0121915 (2002-09-01), Alonso Montull et al.
patent: 6-061314 (1994-03-01), None
patent: 10-214866 (1998-08-01), None
patent: 2000 222033 (2000-08-01), None
patent: 2000 332071 (2000-11-01), None
Shibuya Hisae
Takagi Yuji
Antonelli, Terry Stout & Kraus, LLP.
Charioui Mohamed
Hitachi , Ltd.
Hitachi High-Technologies Corporation
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