Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2009-10-22
2011-11-29
Young, Christopher (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S292000, C430S311000, C430S945000
Reexamination Certificate
active
08067134
ABSTRACT:
The field of this disclosure is making three-dimensional topographic structures by means of graduated exposure in a photosensitive material, such as a photoresist, photosensitive polymide, or similar. Such patterns may be written either to be used directly as optical, mechanical, fluidic, etc. components, e.g. diffusors, non-reflecting surfaces, Fresnel lenses and Fresnel prisms, computer-generated holograms, lenslet arrays, etc, or to be used as masters for the fabrication of such components by replication. Replication can be done by molding, pressing, embossing, electroplating, etching, as known in the art. This disclosure includes descriptions of using passive absorbing components in thin resist, using high gamma thick resists with high resolution pattern generators, using multiple focal planes including at least one focal plane in the bottom half of the resist, and iterative simulation of patterning and adjustment of an exposure map.
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Ekberg Mats
Sandström Torbjörn
Svensson Anders
Wahlsten Mikael
Beffell, Jr. Ernest J.
Haynes Beffel & Wolfeld LLP
Micronic MyData AB
Young Christopher
LandOfFree
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