Extreme ultraviolet photomask and methods and apparatuses...

Details Extreme ultraviolet photomask and methods and apparatuses... Extreme ultraviolet photomask and methods and apparatuses...

2009-12-11

2011-11-01

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08048595

ABSTRACT:
A method of manufacturing a photomask includes forming an upper layer on a photomask substrate, and patterning the upper layer to form an upper pattern having an inclined sidewall, wherein patterning the upper layer includes anisotropically etching the upper layer using charged particles moving in parallel to a first direction inclined toward a top surface of the upper layer.

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patent: 10-2007-0036519 (2007-04-01), None
Sugawara, Minoru, et al., “Effect of incident angle of off-axis illumination on pattern printability in extreme ultraviolet lithography”, J. Vac. Sci. Technol. B21(6), pp. 2701-2705 (Nov./Dec. 2003).

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