Radiation-sensitive compositions and elements containing...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S302000, C430S909000, C101S467000

Reexamination Certificate

active

08048609

ABSTRACT:
A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved sensitivity and solvent resistance. These elements are useful for making lithographic printing plates and printed circuit boards. The composition includes a water-insoluble polymeric binder that has at least 20 mol % of recurring units comprising hydroxyaryl carboxylic acid ester groups, some of which can be substituted with cyclic imide moieties.

REFERENCES:
patent: 6255033 (2001-07-01), Levanon et al.
patent: 6541181 (2003-04-01), Levanon et al.
patent: 2005/0214677 (2005-09-01), Nagashima
patent: 2006/0046199 (2006-03-01), Mitsumoto et al.
patent: 2008/0206678 (2008-08-01), Levanon et al.
patent: 21 30 283 (1971-12-01), None
patent: 1 543 046 (2006-05-01), None
patent: WO 01/09682 (2001-02-01), None
patent: 2004/081662 (2004-09-01), None
U.S. Appl. No. 11/769,766 (D-92228) filed Jun. 28, 2007 titled Radiation-Sensitive Compositions and Elements With Solvent Resistant Poly(Vinyl Acetal)s by M. Levanon et al.
U.S. Appl. No. 11/959,492 (D-94547) filed Dec. 19, 2007 titled Radiation-Sensitive Elements With Developability-Enhancing Compounds by M. Levanon et al.
U.S. Appl. No. 12/195,468 (D-95151) filed Aug. 21, 2008 titled Processing of Positive-Working Lithographic Printing Plate Precursor by M. Levanon et al.
U.S. Appl. No. 12/125,084 (D-94967) filed May 22, 2008 titled Method of Imaging and Developing Positive-Working Imageable Elements by M. Levanon et al.
U.S. Appl. No. 12/025,089 (D-94693) filed Feb. 4, 2008 titled Method of Imaging and Developing Positive-Working Imageable Elements by M. Levanon et al.

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