Defocus determination method using sub-resolution feature...

Details Defocus determination method using sub-resolution feature... Defocus determination method using sub-resolution feature...

2007-05-10

2010-11-23

Dinh, Paul (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000

Reexamination Certificate

active

07840932

ABSTRACT:
The present application is directed to apparatus and methods for determining a magnitude of defocus and a direction of defocus for a photolithography process. A sub-resolution feature on a reticle which is not printed on a wafer at the best focus offset, but is formed on a wafer at some defocus during the photolithography process is analyzed to determine the magnitude and direction of defocus. The magnitude and direction of defocus are used to adjust the photolithography process to an optimal focus based on the determined magnitude of defocus and the determined direction of defocus.

REFERENCES:
patent: 7512928 (2009-03-01), Jessen et al.

Affiliated with

Also associated with

Rating

Defocus determination method using sub-resolution feature... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Defocus determination method using sub-resolution feature..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Defocus determination method using sub-resolution feature... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4251423