Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-06-08
2010-02-09
Kelly, Cynthia H (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S302000
Reexamination Certificate
active
07659048
ABSTRACT:
Disclosed herein is a printing resist sequentially transferred to a printing plate and a substrate after being applied to a printing roll. The printing resist comprises at least one polymer main chain bound to a tackiness-inducing vinyl group. The surface of the printing resist has tackiness without complete dryness, thus enabling a correct transfer of the printing resist to the printing plate and substrate.
REFERENCES:
patent: 6177230 (2001-01-01), Kawamura
patent: 2004/0102548 (2004-05-01), Suzuki
patent: 2004/0197704 (2004-10-01), Eilbeck
Debmalya Roy, P K Bass and S V Eswaran, Photoresist for Microlithography, Resonance, Aug. 2002, pp. 59-66.
Kelly Cynthia H
LG Display Co. Ltd.
McKenna Long & Aldridge
Robinson Chanceity N
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