Self-constrained anisotropic germanium nanostructure from...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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Other Related Categories

C438S478000, C438S674000, C257SE21115, C257SE21131, C257SE21598

Type

Reexamination Certificate

Status

active

Patent number

07659200

Description

ABSTRACT:
A nanostructure comprising germanium, including wires of less than 1 micron in diameter and walls of less than 1 micron in width, in contact with the substrate and extending outward from the substrate is provided along with a method of preparation.

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patent: 5270229 (1993-12-01), Ishihara et al.
patent: 2004/0127012 (2004-07-01), Jin
patent: 19522054 (1996-11-01), None
Sharma et al., “Optical Properties of Ge Nanowires Grown on Silicon (100) and (111) Substrates”, Materials Research Society Symposium Proceedings, vol. 832, pp. 329-334, 2005.
Dailey et al., “Vapor-liquid-solid growth of germanium nanostructures on silicon”, Journal of Applied Physics, vol. 96, No. 12, pp. 7556-7567, 2004.
Schuessler et al., “Electrochemical Deposition of Pd, Ti, and Ge for Applications in GaAs Technology”, Journal of the Electrochemical Society, vol. 143, No. 4, pp. L73-L75, 1996.
Saitou et al., “Evaluation of crystalline germanium thin films electrodeposited on copper substrates from propylene glycol electrolyte”, Surface and Coatings Technology, vol. 162, pp. 101-105, 2002.

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