System, method, and apparatus for monitoring characteristics...

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C702S075000, C702S076000, C702S081000

Reexamination Certificate

active

07822565

ABSTRACT:
A system and method for monitoring RF power is described. In one embodiment the system samples RF power that is generated by an RF generator to obtain RF signals that include information indicative of electrical characteristics at a plurality of particular frequencies that fall within a frequency range. The RF signals are digitized to obtain a stream of digital RF signals that include information indicative of electrical characteristics at the plurality of particular frequencies, and the information indicative of electrical characteristics is successively transformed, for each of the plurality of particular frequencies, from a time domain into a frequency domain.

REFERENCES:
patent: 5045956 (1991-09-01), Ejima
patent: 5059915 (1991-10-01), Grace et al.
patent: 5523955 (1996-06-01), Heckman
patent: 6046594 (2000-04-01), Mavretic
patent: 6194898 (2001-02-01), Magnuson et al.
patent: 6351683 (2002-02-01), Johnson et al.
patent: 6522121 (2003-02-01), Coumou
patent: 6707255 (2004-03-01), Coumou
patent: 6838832 (2005-01-01), Howald
patent: 7142835 (2006-11-01), Paulus
patent: 2006/0170367 (2006-08-01), Bhutta
Kim, Ju Sik, “Written Opinion of the International Searching Authority”, Jun. 30, 2009, Publisher: Korean Intellectual Property Office.
Discrete Fourier Transform, obtained from: http://en.wikipedia.org/wiki/Discrete—Fourier—transform; original publication date: unknown; site visited Sep. 10, 2009.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

System, method, and apparatus for monitoring characteristics... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System, method, and apparatus for monitoring characteristics..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System, method, and apparatus for monitoring characteristics... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4222570

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.