Liquid crystal display device and fabricating method thereof

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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Details

C438S030000, C438S151000, C257S072000

Reexamination Certificate

active

07727824

ABSTRACT:
A liquid crystal display device may comprise a semiconductor layer on a substrate and including a channel portion and ohmic contact portions at both sides of the channel portion, wherein an edge portion of the semiconductor layer has a side surface of a substantially tapered shape; a gate insulating layer covering the semiconductor layer; a gate electrode on the gate insulating layer and substantially corresponding to the channel portion; source and drain electrodes contacting the semiconductor layer; and a pixel electrode contacting the drain electrode.

REFERENCES:
patent: 6107173 (2000-08-01), Han
patent: 6284637 (2001-09-01), Chhagan et al.
patent: 2003/0183857 (2003-10-01), Korenari
patent: 2005/0127366 (2005-06-01), Jeong et al.
patent: 2005/0156239 (2005-07-01), Seko et al.
patent: 2000-31493 (2000-01-01), None
patent: 2002-343976 (2002-11-01), None
Wolf et al., “Silicon Processing for the VLSI Era, vol. 1—Process Technology”, Lattice Press, second edition, 2000, pp. 686-688.

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