Electrical fuses and resistors having sublithographic...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified configuration

Reexamination Certificate

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C257S784000, C257SE23141, C257SE23147, C257SE23149, C257SE21592

Reexamination Certificate

active

07741721

ABSTRACT:
Electrical fuses and resistors having a sublithographic lateral or vertical dimension are provided. A conductive structure comprising a conductor or a semiconductor is formed on a semiconductor substrate. At least one insulator layer is formed on the conductive structure. A recessed area is formed in the at least one insulator layer. Self-assembling block copolymers are applied into the recessed area and annealed to form a first set of polymer blocks and a second set of polymer blocks. The first set of polymer blocks are etched selective to the second set and the at least one insulator layer. Features having sublithographic dimensions are formed in the at least one insulator layer and/or the conductive structure. Various semiconductor structures having sublithographic dimensions are formed including electrical fuses and resistors.

REFERENCES:
patent: 2002/0158342 (2002-10-01), Tuominen et al.
patent: 2002/0189350 (2002-12-01), Tu
patent: 2006/0175667 (2006-08-01), Tsuchiaki
patent: 2006/0197157 (2006-09-01), Koyama et al.
Yang, Haining et al., “Sub-Lithographic Feature Patterning Using Self-Aligned Self-Assembly Polymers”, U.S. Appl. No. 11/424,963, filed Jun. 19, 2006.
Nealey, Paul F., “Self-assembling resists for nanolithography”, IEDM Technical Digest, Dec. 2005, Digital Object Identifier 10.1109/IEDM.2005.1609349, IEEE.

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