Test structure for charged particle beam inspection and...

Active solid-state devices (e.g. – transistors – solid-state diode – Test or calibration structure

Reexamination Certificate

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C438S018000, C324S1540PB, C257SE23179, C257SE21521

Reexamination Certificate

active

07737440

ABSTRACT:
A test structure and a method for fabricating the same are disclosed. The test structure includes a plurality of sampling lines over a substrate located between a plurality of a first grounding lines and a plurality of a second grounding lines. The sampling lines are selectively electrically coupled to the first grounding line or the second grounding line and include at least one programmed defect. A double-patterning fabricating approach is utilized to produce such test structure which may be applied to a charged particle beam such as an electron-beam defect inspection system.

REFERENCES:
patent: 2008/0246030 (2008-10-01), Satya et al.

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