Methods for reducing spherical aberration effects in...

Details Methods for reducing spherical aberration effects in... Methods for reducing spherical aberration effects in...

2006-09-05

2010-02-02

Davis, Daborah Chacko (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C356S124000, C356S125000

Reexamination Certificate

active

07655384

ABSTRACT:
Methods to at least partially compensate for photoresist-induced spherical aberration that occurs during mask imaging used for photolithographic processing of semiconductor devices, LCD elements, thin-film magnetic heads, reticles and other substrates including photo-defined structures thereon are disclosed. A photoresist or other photosensitive material may be irradiated with a mask pattern image including a selected nonzero spherical aberration value to compensate for photoresist-induced spherical aberration.

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