Method for selecting photomask substrate, method for...

Details Method for selecting photomask substrate, method for... Method for selecting photomask substrate, method for...

2006-10-24

2010-06-22

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C382S144000

Reexamination Certificate

active

07740994

ABSTRACT:
According to an aspect of the invention, there is provided a method for selecting a photomask substrate, including dividing a chip area scheduled to be arranged on the photomask substrate regarding a specific transfer pattern layer into a management pattern area in which an element pattern changed in shape by birefringence of the photomask substrate is arranged, and an area other than the management pattern area, setting a standard value of a size of birefringence of an area in which the management pattern area of the photomask substrate is arranged, inspecting the size of the birefringence of each of a plurality of photomask substrate candidates, and selecting a photomask substrate, in which the size of the birefringence satisfies the standard value, as a photomask substrate of the specific transfer pattern layer from the plurality of photomask substrate candidates.

REFERENCES:
patent: 6413682 (2002-07-01), Shibano et al.
patent: 6483937 (2002-11-01), Samuels
patent: 6758063 (2004-07-01), Priestley et al.
patent: 6783898 (2004-08-01), Berkey et al.
patent: 2002/0187407 (2002-12-01), Priestley et al.
patent: 2004/0010385 (2004-01-01), Fukuhara et al.
patent: 2000-330263 (2000-11-01), None
patent: 3246615 (2001-11-01), None

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