Resin for photoresist composition, photoresist composition...

Details Resin for photoresist composition, photoresist composition... Resin for photoresist composition, photoresist composition...

2009-02-04

2010-11-09

Kelly, Cynthia H (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S908000, C430S914000, C526S078000, C526S085000, C526S224000

Reexamination Certificate

active

07829259

ABSTRACT:
A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the carbon atom in the α-position to the hydroxyl group has at least one electron attractive group.

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