Vertical plasma processing method for forming silicon...

Details Vertical plasma processing method for forming silicon... Vertical plasma processing method for forming silicon...

2009-03-25

2010-11-02

Smoot, Stephen W (Department: 2813)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C257SE21493, C427S255395

Reexamination Certificate

active

07825039

ABSTRACT:
A vertical plasma processing apparatus for a semiconductor process includes a process container having a process field configured to accommodate a plurality of target substrates at intervals in a vertical direction, and a marginal space out of the process field. In processing the target substrates, a control section simultaneously performs supply of a process gas to the process field from a process gas supply circuit and supply of a blocking gas to the marginal space from a blocking gas supply circuit to inhibit the process gas from flowing into the marginal space.

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