Designing an optical metrology system optimized with signal...

Details Designing an optical metrology system optimized with signal... Designing an optical metrology system optimized with signal...

2008-03-27

2010-06-22

Bui, Bryan (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system in a specific environment

Quality evaluation

C356S601000, C438S016000

Reexamination Certificate

active

07742889

ABSTRACT:
Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to the one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.

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