Semiconductor device and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S154000, C257S296000, C257S335000, C257S341000, C257S351000, C257S358000, C257S516000, C438S017000

Reexamination Certificate

active

07821069

ABSTRACT:
A semiconductor device includes: n transistor elements; n resistive elements; and n capacitive elements, each kind of elements coupled in series between the first and second terminals. The gate of each transistor element has a gate pad, and each transistor element includes transistor pads disposed on both sides. Each resistive element includes resistive pads disposed on both sides. Each capacitive element includes capacitive pads disposed on both sides. The gate pad other than the first stage transistor element, a corresponding resistive pad, and a corresponding capacitive pad are electrically coupled. One transistor pad, one resistive pad, and one capacitive pad in the first stage are electrically coupled. One transistor pad, one resistive pad, and one capacitive pad in the n-th stage are electrically coupled.

REFERENCES:
patent: 4394590 (1983-07-01), Honda
patent: 4751408 (1988-06-01), Rambert
patent: 6392950 (2002-05-01), Ayukawa et al.
patent: 6411561 (2002-06-01), Ayukawa et al.
patent: 6587393 (2003-07-01), Ayukawa et al.
patent: 6847575 (2005-01-01), Ayukawa et al.
patent: 2005/0128853 (2005-06-01), Ayukawa et al.
patent: 2006/0231868 (2006-10-01), Yamada et al.
patent: 10313264 (2004-10-01), None
patent: A-08-079035 (1996-03-01), None
patent: A-2003-332520 (2003-11-01), None
The Nikkan Kogyo Shimbun, Ltd.,Application Technique of Power MOSFET, pp. 129-131 (with English translation).
Office Action issued from German Patent Office dated Mar. 27, 2009 in the corresponding German Patent Application No. 102008006124.7 (and English Translation).
The Nikkan Kogyo Shimbun, Ltd.,Application Technique of Power MOSFET, Published Oct. 24, 1988, pp. 128-131 (with English Translation).

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