Resist pattern thickening material, process for forming...

Details Resist pattern thickening material, process for forming... Resist pattern thickening material, process for forming...

2004-08-03

2010-02-16

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S270100, C430S905000, C430S913000, C430S330000, C430S331000

Reexamination Certificate

active

07662539

ABSTRACT:
The present invention provides a resist pattern thickening material which can thicken a resist pattern and form a fine space pattern, exceeding exposure limits of exposure light used during patterning. The resist pattern thickening material contains a resin and a phase transfer catalyst. The present invention also provides a process for forming a resist pattern and a process for manufacturing a semiconductor device, wherein the resist pattern thickening material of the present invention is suitably utilized.

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