Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-10-27
2010-12-28
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S913000, C568S019000, C568S028000
Reexamination Certificate
active
07858289
ABSTRACT:
A positive resist composition for electron beam, X-ray or EUV includes a compound having a proton acceptor functional group and capable of producing an acid radical upon irradiation with an actinic ray or radiation to reduce or lose the acceptor property or to change the proton acceptor functional group to be acidic, wherein the positive resist composition has a solid content concentration of from 2.5 to 4.5 mass %.
REFERENCES:
patent: 6033826 (2000-03-01), Urano et al.
patent: 6210859 (2001-04-01), Jeon et al.
patent: 6384169 (2002-05-01), Watanabe et al.
patent: 7449573 (2008-11-01), Kodama et al.
patent: 2006/0210922 (2006-09-01), Nishiyama
patent: 2008/0102407 (2008-05-01), Ohsawa et al.
patent: 2009/0075202 (2009-03-01), Kodama et al.
patent: 1500977 (2005-01-01), None
patent: 1703322 (2006-09-01), None
patent: 6-242606 (1994-09-01), None
patent: 2001-107707 (2001-04-01), None
patent: 2001-166474 (2001-06-01), None
patent: 2001-166478 (2001-06-01), None
patent: 2001-194792 (2001-07-01), None
patent: 2003-107708 (2003-04-01), None
patent: 2005-234434 (2005-09-01), None
patent: 2006-208781 (2006-08-01), None
patent: 2007-210904 (2007-08-01), None
FUJIFILM Corporation
Sughrue & Mion, PLLC
Walke Amanda C.
LandOfFree
Positive resist composition for electron beam, X-ray or EUV... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive resist composition for electron beam, X-ray or EUV..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition for electron beam, X-ray or EUV... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4156821