Thin-film transistor and method for forming the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257 67, 257330, 257347, 257401, 257622, 437 40, 437225, 437235, H01L 2976

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055571263

ABSTRACT:
A transistor is formed on a substrate of dielectric material. The transistor includes a layer of semiconductor material that is formed on the substrate and has a source region and a drain region. The layer also has a channel region that is in a recess of the substrate and adjacent to the source and drain regions. The channel is self-aligned, as are the light doped source and drain regions.

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patent: 5416346 (1995-05-01), Nagakawa et al.
Murakami, Shuji et al., "A 21 mW 4Mb CMOS SRAM for Battery Operation," IEEE ISSCC, 1991, pp. 46-47, Jan.
Ishibashi, Koichiro et al., "A 1V TFT-Load SRAM Using a Two-Step Word-Voltage Method", IEEE ISSCC, 1992, pp. 206-207, Jan.
Sasaki, Katsuro et al., "A 7ns 140mW 1Mb CMOS SRAM with Current Sense Amplifier," IEEE ISSCC, 1992, pp. 208-209, Jan.
Goto, Hiroyuki et al., "A 3.3V 12ns 16Mb CMOS SRAM," IEEE ISSCC, 1992, pp. 216-217, Jan.
Liu, C. T. et al., "High Reliability and High Performance 0.35 .mu.m Gate-Inverted TFT's for 16 Mbit SRAM Applications Using Self-Aligned LDD Structures," IEEE IEDM, 1992, pp. 823-826, Jan.
Hayden, J. D. et al., "A High-Performance Quadruple Well, Quadruple Poly BiCMOS Process for Fast 16 Mb SRAMs", IEEE IEDM, 1992, pp. 819-822, Jan.
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