Light emitting device and method of manufacturing the same

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S660000, C257S098000, C257S102000, C257SE21166, C257SE33064

Reexamination Certificate

active

07541207

ABSTRACT:
A light emitting device and a method of manufacturing the same are provided. A light emitting device has a structure wherein a substrate, an n-type clad layer, a light emitting layer, a p-type clad layer, an ohmic contact layer, and a reflective layer are successively stacked. The ohmic contact layer is formed by adding an additional element to an indium oxide. According to the light emitting device and the method of manufacturing the same, the characteristics of ohmic contact with a p-type clad layer is improved, thus increasing the efficiency and yield of wire bonding during packaging FCLEDS. Also, it is possible to increase the light emitting efficiency and life span of light emitting devices due to the low contactless resistance and the excellent electric current and voltage characteristic.

REFERENCES:
patent: 6469324 (2002-10-01), Wang
patent: 6593597 (2003-07-01), Sheu
patent: 6603146 (2003-08-01), Hata et al.
patent: 6787383 (2004-09-01), Ikeda et al.
patent: 6794690 (2004-09-01), Uemura
patent: 6797987 (2004-09-01), Chen
patent: 6869820 (2005-03-01), Chen
patent: 6936859 (2005-08-01), Uemura et al.
patent: 6958494 (2005-10-01), Lin et al.
patent: 7005684 (2006-02-01), Uemura et al.
patent: 2003/0190764 (2003-10-01), Lee et al.
patent: P-1999-0088218 (1999-12-01), None
patent: 10-2002-0026737 (2002-04-01), None
Official Action issued by the Chinese Patent Office on Apr. 7, 2007, in corresponding Chinese Patent Application No. 200410103818.2; and English translation thereof.
Korean Office Action for Application No. 10-2003-0062830, dated Aug. 30, 2005, and translation.
European Search Report issued in Corres. EP 04255416 on Oct. 27, 2006, The Hague, The Netherlands.
Gessmann, T., et al., “GaInN light-emitting diodes with omni directional reflectors”, Proceedings of the SPIE—The International Society for Optical Engineering, Jul. 2003, pp. 139-144, vol. 4996, SPIE, USA.
Kim, D.W., et al., “A study of transparent indium tin oxide(ITO)contact to p-GaN”, Thin Solid Films, Nov. 2001, pp. 87-92, vol. 398-399, Elsevier Sequoia, The Netherlands.
Aliyu, Y.H., et al., “AlGaInP LEDs using reactive thermally evaporated transparent conducting indium tin oxide(ITO)”, Electronics Letters, Dec. 7, 1995, pp. 2210-2212, vol. 31, No. 25, IEE, Stevenage, England, GB.
Horng, Ray-Hua, et al., “Low-resistance and high-transparency Ni/indium tin oxide ohmic contacts to p-type GaN”, Applied Physics Letters, Oct. 29, 2001, pp. 2925-2927, vol. 79, No. 18, American Institute of Physics, Melville, NY, US.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Light emitting device and method of manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Light emitting device and method of manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Light emitting device and method of manufacturing the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4131302

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.