Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2004-12-30
2009-11-24
Nguyen, Dao H (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
Reexamination Certificate
active
07622764
ABSTRACT:
Semiconductor devices and a fabricating method therefore are disclosed. One example method includes forming a buffer oxide layer and a buffer nitride layer on the top surface of a semiconductor substrate; forming a photoresist pattern on the pad nitride layer and forming a trench by etching the buffer nitride layer, the buffer oxide layer and the semiconductor substrate by a predetermined etch using the photoresist pattern as a mask; forming sidewall floating gates on the lateral faces of the trench; depositing polysilicon on the entire surface of the resulting structure; forming a gate electrode by patterning the polysilicon of the resulting structure; removing the buffer nitride layer and forming a poly oxide layer on the exposed part of the polysilicon of the gate electrode; forming source/drain regions by implanting impurities into the predetermined part of the resulting structure; injecting electric charges into the sidewall floating gates; and forming spacers on the lateral faces of the sidewall floating gates and the gate electrode.
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Dongbu Electronics Co. Ltd.
Nguyen Dao H
Nguyen Tram H
Saliwanchik Lloyd & Saliwanchik
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