Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2008-04-11
2009-12-29
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S191000, C430S192000, C430S193000, C430S270100, C430S313000, C430S326000, C438S149000, C438S151000
Reexamination Certificate
active
07638253
ABSTRACT:
In one example, a photoresist composition includes about 1 to about 70 parts by weight of a first binder resin including a repeat unit represented by the following Chemical Formula 1, about 1 to about 70 parts by weight of a second binder resin including a repeat unit represented by the following Chemical Formula 2, about 0.5 to about 10 parts by weight of a photo-acid generator, about 1 to about 20 parts by weight of a cross-linker and about 10 to about 200 parts by weight of a solvent. The photoresist composition may improve the heat resistance and adhesion ability of a photoresist pattern.wherein R1and R2independently represent an alkyl group having 1 to 5 carbon atoms, and n and m independently represent a natural number.
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Jung Doo-Hee
Koo Ki-Hyuk
Lee Hi-Kuk
Park Jeong-Min
Youn Hyoc-Min
Chu John S
Innovation Counsel LLP
Samsung Electronics Co,. Ltd.
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