Memory utilizing oxide-nitride nanolaminates

Static information storage and retrieval – Floating gate – Particular connection

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C365S185030

Reexamination Certificate

active

07489545

ABSTRACT:
Structures, systems and methods for transistors utilizing oxide-nitride nanolaminates are provided. One transistor embodiment includes a first source/drain region, a second source/drain region, and a channel region therebetween. A gate is separated from the channel region by a gate insulator. The gate insulator includes oxide-nitride nanolaminate layers to trap charge in potential wells formed by different electron affinities of the oxide-nitride nanolaminate layers.

REFERENCES:
patent: 3665423 (1972-05-01), Nakamuma et al.
patent: 3877054 (1975-04-01), Boulin et al.
patent: 3964085 (1976-06-01), Kahng et al.
patent: 4217601 (1980-08-01), DeKeersmaecker et al.
patent: 4507673 (1985-03-01), Aoyama et al.
patent: 4661833 (1987-04-01), Mizutani
patent: 4939559 (1990-07-01), DiMaria et al.
patent: 5016215 (1991-05-01), Tigelaar
patent: 5017977 (1991-05-01), Richardson
patent: 5021999 (1991-06-01), Kohda et al.
patent: 5027171 (1991-06-01), Reedy et al.
patent: 5111430 (1992-05-01), Morie
patent: 5253196 (1993-10-01), Shimabukuro
patent: 5274249 (1993-12-01), Xi et al.
patent: 5293560 (1994-03-01), Harari
patent: 5298447 (1994-03-01), Hong
patent: 5303182 (1994-04-01), Nakao et al.
patent: 5317535 (1994-05-01), Talreja et al.
patent: 5388069 (1995-02-01), Kokubo
patent: 5409859 (1995-04-01), Glass et al.
patent: 5424993 (1995-06-01), Lee et al.
patent: 5430670 (1995-07-01), Rosenthal
patent: 5434815 (1995-07-01), Smarandoiu et al.
patent: 5438544 (1995-08-01), Makino
patent: 5449941 (1995-09-01), Yamazaki et al.
patent: 5467306 (1995-11-01), Kaya et al.
patent: 5477485 (1995-12-01), Bergemont et al.
patent: 5485422 (1996-01-01), Bauer et al.
patent: 5493140 (1996-02-01), Iguchi
patent: 5508543 (1996-04-01), Hartstein et al.
patent: 5508544 (1996-04-01), Shah
patent: 5530581 (1996-06-01), Cogan
patent: 5602777 (1997-02-01), Nawaki et al.
patent: 5627781 (1997-05-01), Hayashi et al.
patent: 5670790 (1997-09-01), Katoh et al.
patent: 5677867 (1997-10-01), Hazani
patent: 5698022 (1997-12-01), Glassman et al.
patent: 5714766 (1998-02-01), Chen et al.
patent: 5754477 (1998-05-01), Forbes
patent: 5768192 (1998-06-01), Eitan
patent: 5795808 (1998-08-01), Park
patent: 5801401 (1998-09-01), Forbes
patent: 5828605 (1998-10-01), Peng et al.
patent: 5852306 (1998-12-01), Forbes
patent: 5886368 (1999-03-01), Forbes et al.
patent: 5912488 (1999-06-01), Kim et al.
patent: 5916365 (1999-06-01), Sherman
patent: 5936274 (1999-08-01), Forbes et al.
patent: 5943262 (1999-08-01), Choi
patent: 5959896 (1999-09-01), Forbes
patent: 5973356 (1999-10-01), Noble
patent: 5989958 (1999-11-01), Forbes
patent: 5991225 (1999-11-01), Forbes et al.
patent: 6005790 (1999-12-01), Chan et al.
patent: 6011725 (2000-01-01), Eitan
patent: 6013553 (2000-01-01), Wallace et al.
patent: 6020024 (2000-02-01), Maiti et al.
patent: 6027961 (2000-02-01), Maiti et al.
patent: 6031263 (2000-02-01), Forbes et al.
patent: 6049479 (2000-04-01), Thurgate et al.
patent: 6072209 (2000-06-01), Noble
patent: 6110529 (2000-08-01), Gardiner et al.
patent: 6115281 (2000-09-01), Aggarwal et al.
patent: 6122201 (2000-09-01), Lee et al.
patent: 6124729 (2000-09-01), Noble
patent: 6140181 (2000-10-01), Forbes et al.
patent: 6143636 (2000-11-01), Forbes et al.
patent: 6153468 (2000-11-01), Forbes
patent: 6160739 (2000-12-01), Wong
patent: 6166401 (2000-12-01), Forbes
patent: 6171900 (2001-01-01), Sun
patent: 6194228 (2001-02-01), Fujiki et al.
patent: 6203613 (2001-03-01), Gates et al.
patent: 6222768 (2001-04-01), Hollmer et al.
patent: 6225168 (2001-05-01), Gardner et al.
patent: 6232643 (2001-05-01), Forbes et al.
patent: 6238976 (2001-05-01), Noble et al.
patent: 6243300 (2001-06-01), Sunkavalli
patent: 6246606 (2001-06-01), Forbes et al.
patent: 6249020 (2001-06-01), Forbes et al.
patent: 6255683 (2001-07-01), Radens et al.
patent: 6269023 (2001-07-01), Derhacobian et al.
patent: 6294813 (2001-09-01), Forbes et al.
patent: 6297539 (2001-10-01), Ma et al.
patent: 6303481 (2001-10-01), Park
patent: 6313518 (2001-11-01), Ahn et al.
patent: 6320784 (2001-11-01), Muralidhar et al.
patent: 6320786 (2001-11-01), Chang et al.
patent: 6351411 (2002-02-01), Forbes et al.
patent: 6353554 (2002-03-01), Banks
patent: 6365470 (2002-04-01), Maeda
patent: 6380579 (2002-04-01), Nam et al.
patent: 6407435 (2002-06-01), Ma et al.
patent: 6429063 (2002-08-01), Eitan
patent: 6432779 (2002-08-01), Hobbs et al.
patent: 6438031 (2002-08-01), Fastow
patent: 6445030 (2002-09-01), Wu et al.
patent: 6449188 (2002-09-01), Fastow
patent: 6456531 (2002-09-01), Wang et al.
patent: 6456536 (2002-09-01), Sobek et al.
patent: 6459618 (2002-10-01), Wang
patent: 6465306 (2002-10-01), Ramsbey et al.
patent: 6487121 (2002-11-01), Thurgate et al.
patent: 6490204 (2002-12-01), Bloom et al.
patent: 6490205 (2002-12-01), Wang et al.
patent: 6504755 (2003-01-01), Katayama et al.
patent: 6521950 (2003-02-01), Shimabukuro et al.
patent: 6521958 (2003-02-01), Forbes et al.
patent: 6525969 (2003-02-01), Kurihara et al.
patent: 6541816 (2003-04-01), Ramsbey et al.
patent: 6545314 (2003-04-01), Forbes et al.
patent: 6552387 (2003-04-01), Eitan
patent: 6559014 (2003-05-01), Jeon
patent: 6566699 (2003-05-01), Eitan
patent: 6567303 (2003-05-01), Hamilton et al.
patent: 6567312 (2003-05-01), Torii et al.
patent: 6570787 (2003-05-01), Wang et al.
patent: 6580118 (2003-06-01), Ludwig et al.
patent: 6580124 (2003-06-01), Cleeves et al.
patent: 6618290 (2003-09-01), Wang et al.
patent: 6630381 (2003-10-01), Hazani
patent: 6642573 (2003-11-01), Halliyal et al.
patent: 6674138 (2004-01-01), Halliyal et al.
patent: 6714455 (2004-03-01), Banks
patent: 6867097 (2005-03-01), Ramsbey et al.
patent: 6873539 (2005-03-01), Fazan et al.
patent: 7045430 (2006-05-01), Ahn et al.
patent: 7193893 (2007-03-01), Forbes
patent: 7221017 (2007-05-01), Forbes et al.
patent: 7221586 (2007-05-01), Forbes et al.
patent: 7348237 (2008-03-01), Forbes
patent: 7369435 (2008-05-01), Forbes
patent: 2002/0003252 (2002-01-01), Iyer
patent: 2002/0027264 (2002-03-01), Forbes et al.
patent: 2002/0036939 (2002-03-01), Tsai et al.
patent: 2002/0074565 (2002-06-01), Flagan et al.
patent: 2002/0089023 (2002-07-01), Yu et al.
patent: 2002/0115252 (2002-08-01), Haukka et al.
patent: 2002/0192974 (2002-12-01), Ahn et al.
patent: 2003/0032270 (2003-02-01), Snyder et al.
patent: 2003/0235077 (2003-12-01), Forbes
patent: 2003/0235081 (2003-12-01), Forbes
patent: 2003/0235085 (2003-12-01), Forbes
patent: 2004/0063276 (2004-04-01), Yamamoto et al.
patent: 2006/0001080 (2006-01-01), Forbes
patent: 2006/0002188 (2006-01-01), Forbes
patent: 2006/0284246 (2006-12-01), Forbes et al.
patent: 2007/0178643 (2007-08-01), Forbes et al.
patent: 03-222367 (1991-10-01), None
patent: 06-224431 (1994-08-01), None
patent: 06-302828 (1994-10-01), None
patent: 08-255878 (1996-10-01), None
Abbas, S.A., et al., “N-Channel Igfet Design Limitations Due to Hot Electron Trapping”,Technical Digest, International Electron Devices Meeting,,Washington, DC,(Dec. 1975),35-38.
Adelmann, C, et al., “Atomic-layer epitaxy of GaN quantum wells and quantum dots on (0001) AIN”,Journal of Applied Physics, 91(8). (Apr. 15, 2002),5498-5500.
Ahn, Seong-Deok, et al., “Surface Morphology Improvement of Metalorganic Chemical Vapor Deposition Al Films by Layered Deposition of Al and Ultrathin TiN”,Japanese Journal of Applied Physics, Part 1(Regular Papers, Short Notes & Review Papers),39(6A), (Jun. 2000),3349-3354.
Akasaki, Isamu, et al., “Effects of AIN Buffer Layer on Crystallographic Structure and on Electrical and Optical Properties of GaN and Ga1-xAlxN Films Grown on Sapphire Substrate by MOVPE”,Journal of Crystal Growth, 98(1-2). (Nov. 1, 1989),209-219.
Alen, Petra, “Atomic Layer deposition of Ta(Al)N(C) thin films using trimethylaluminum as a reducing agent”,Journal of the Electrochemical Society, 148(10). (Oct. 2001),G566-G571.
Asari, K, et al., “Multi-mode and multi-level technologies for FeRAM embedded reconfigurable hardware”,Solid-State Circuits Conference, 1999. Digest of Technical Papers

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Memory utilizing oxide-nitride nanolaminates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Memory utilizing oxide-nitride nanolaminates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Memory utilizing oxide-nitride nanolaminates will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4112773

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.