Photoactive compounds

Details Photoactive compounds Photoactive compounds

2006-12-20

2009-10-13

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S330000, C430S905000, C430S910000, C430S919000, C562S113000, C564S082000

Reexamination Certificate

active

07601480

ABSTRACT:
The present application relates to a compound of formulawhere X is selected from the group CF3SO3, C4F9SO3, N(SO2C2F5)2, N(SO2CF3SO2C4F9), N(SO2C3F7)2, N(SO2C4F9)2, CF3CHFO(CF2)2SO3, and CH3CH2CH2O(CF2)4SO3. A photoresist composition comprising a polymer containing an acid labile group, the above compounds, and one or more additional photoacid generators is also provided for.

REFERENCES:
patent: 6133338 (2000-10-01), Kimura et al.
patent: 6410204 (2002-06-01), Kodama et al.
patent: 6605409 (2003-08-01), Kodama et al.
patent: 6844132 (2005-01-01), Kodama et al.
patent: 6930134 (2005-08-01), Suzuki et al.
patent: 2004/0197702 (2004-10-01), Shirakawa et al.

Affiliated with

Also associated with

Rating

Photoactive compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoactive compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoactive compounds will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4107315