Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-09-25
2009-11-10
Chiang, Jack (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000
Reexamination Certificate
active
07617478
ABSTRACT:
One embodiment of the present invention provides a system that converts a non-bandlimited pattern layout into a band-limited pattern image to facilitate simulating an optical lithography process. During operation, the system receives the non-bandlimited pattern layout which comprises one or more polygons. The system further receives an anti-aliasing filter (AAF) kernel, wherein the AAF kernel is configured to convert a non-bandlimited pattern into a band-limited pattern. The system then constructs an AAF lookup table for the AAF kernel, wherein the AAF lookup table contains precomputed values for a set of convolution functions which are obtained by convolving a set of basis functions with the AAF kernel. Next, the system creates a sampled pattern layout by applying a grid map over the pattern layout. The system then obtains the band-limited pattern image by using the AAF lookup table to convolve the AAF kernel with each grid location in the sampled pattern layout.
REFERENCES:
patent: 6081685 (2000-06-01), Umetani
patent: 6289499 (2001-09-01), Rieger et al.
patent: 6647137 (2003-11-01), Lu
patent: 7003755 (2006-02-01), Pang et al.
patent: 2007/0061773 (2007-03-01), Ye et al.
Cranford Micheal
Rieger Michael L.
Stirniman John P.
Chiang Jack
Park Vaughan & Fleming LLP
Synopsys Inc.
Tat Binh C
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